Title:
PATTERN DRAWING DEVICE AND PATTERN DRAWING METHOD
Document Type and Number:
WIPO Patent Application WO/2016/204267
Kind Code:
A1
Abstract:
Through the present invention, optical performance or arrangement precision of a scanning line necessary for highly detailed pattern drawing is stably maintained. A pattern drawing device (EX) for drawing a predetermined pattern on a substrate (P) by performing main scanning of a spot light (SP) condensed on the substrate (P) along a drawing line (SL) and performing secondary scanning of the substrate (P) condenses a first beam (LBa) reflected by a polygon mirror (PM) to form a spot light (SPa) and projects the spot light (SPa) on a first drawing line (SLa), and condenses a second beam (LBb) reflected by the polygon mirror (PM) to form a spot light (SPb) and projects the spot light (SPb) on a second drawing line (SLb). The two drawing lines (SLa, SLb) are in the same position on the substrate (P) relative to the direction of secondary scanning and are in offset positions in the direction of main scanning.
Inventors:
KOMIYAMA HIROKI (JP)
Application Number:
PCT/JP2016/068075
Publication Date:
December 22, 2016
Filing Date:
June 17, 2016
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G02B26/12; G02B26/10; G03F7/20; H04N1/113
Domestic Patent References:
| WO2013145683A1 | 2013-10-03 |
Foreign References:
| JPS58105117A | 1983-06-22 | |||
| JPH1048558A | 1998-02-20 | |||
| JP2006058795A | 2006-03-02 | |||
| JP2012163868A | 2012-08-30 | |||
| JP2011090188A | 2011-05-06 | |||
| JP2003140069A | 2003-05-14 | |||
| JP2012220695A | 2012-11-12 | |||
| JP2015210437A | 2015-11-24 | |||
| JP2008263090A | 2008-10-30 |
Attorney, Agent or Firm:
CHIBA Yoshihiro et al. (JP)
Takehiro Chiba (JP)
Takehiro Chiba (JP)
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