Title:
PATTERN DRAWING DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/049940
Kind Code:
A1
Abstract:
While modulating the intensity of a drawing beam (LBn) to be projected as spot light (SP') to a substrate (P) on the basis of drawing data of a pattern defined by multiple pixels (PIC), this pattern drawing device (EX) relatively scans the projection position of the spot light (SP') along two-dimensional arrangement of the pixels (PIC) on the substrate (P). The pattern drawing device (EX) is provided with: a light source unit (LS) which, on the basis of the drawing data, emits a predetermined number of pulsed light beams to be oscillated as drawing beams with a predetermined period (Tf) to respective exposure pixels that are irradiated with the spot light (SP') during the relative scanning, and suspends the emission of the predetermined number of pulsed light beams to respective non-exposure pixels that are not irradiated with the spot light (SP') during the relative scanning; and a drawing control unit (200) which controls the light source unit (LS) such that the number of pulsed light beams to be emitted to edge part exposure pixels (PIC') corresponding to an edge part of the pattern among the exposure pixels increases or decreases relatively to the predetermined number.
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Inventors:
KITO YOSHIAKI (JP)
KATO MASAKI (JP)
KATO MASAKI (JP)
Application Number:
PCT/JP2018/033073
Publication Date:
March 14, 2019
Filing Date:
September 06, 2018
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F7/20; B41J2/47; G02B26/12; H05K3/00
Foreign References:
| JP2001225393A | 2001-08-21 | |||
| JP2017067823A | 2017-04-06 | |||
| JPH0835937A | 1996-02-06 |
Attorney, Agent or Firm:
CHIBA Yoshihiro et al. (JP)
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