Title:
PATTERN DRAWING DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/082850
Kind Code:
A1
Abstract:
This pattern drawing device is provided with: a first cylindrical lens (CYa) on which a beam (LB) from a light source device is incident and which has an anisotropic refractive power for converging, in a sub-scanning direction orthogonal to a main scanning direction, the beam (LB) traveling toward a reflection surface (RPa) of a polygon mirror (PM); an fθ lens system (FT) for causing the beam (LB) having been deflected by the reflection surface (RPa) of the polygon mirror (PM) to be incident thereon, and for condensing the beam as a spot light (SP) on a surface (Po) of an object to be irradiated; and a second cylindrical lens (CYb) having an anisotropic refractive power for converging, in the sub-scanning direction, the beam (LB) traveling toward the surface (Po) after being emitted from the fθ lens system (FT). The focus length of the second optical system is set such that the curved amount of the beam (LB) due to sagittal coma aberration caused before the beam (LB) is incident on the second cylindrical lens (CYb) after passing the position of the peripheral image height of a beam scanning range within the visual field of the fθ lens system (FT), is equal to or smaller than the radius of an airy disc.
More Like This:
| JPH10253915 | OPTICAL SCANNER |
Inventors:
KATO MASAKI (JP)
NAKAYAMA SHUICHI (JP)
NAKAYAMA SHUICHI (JP)
Application Number:
PCT/JP2018/039214
Publication Date:
May 02, 2019
Filing Date:
October 22, 2018
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G02B26/10; G02B13/00; G02B13/18; G02B26/12; G03F7/20
Foreign References:
| JP2000121976A | 2000-04-28 | |||
| JPS55127514A | 1980-10-02 | |||
| JPH07128610A | 1995-05-19 | |||
| JP2000162499A | 2000-06-16 |
Attorney, Agent or Firm:
CHIBA Yoshihiro et al. (JP)
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