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Patent Searching and Data


Title:
PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/059420
Kind Code:
A8
Abstract:
The present invention accurately forms a micro-scale pattern by suppressing edge errors at flat corner portions in the exposure image data for maskless exposure. The minimum exposure units of a light beam are plotted upon an exposure surface, and the on region of the light beam that will be necessary in correction of the exposure image data is specified as a set of minimum exposure units. The light beam intensity distribution of each minimum exposure unit within the on region is acquired, and the distributions are cumulated to obtain the accumulated intensity distribution of the on region. The accumulated intensity distribution is compared to a set threshold, and a profile connecting, upon the exposure surface, points where the accumulated intensity distribution matches the threshold is obtained as an accumulated intensity profile (AIP). In order to reduce the difference area enclosed between the outer edge of the on region and the AIP, an on unit at which the light beam is turned on is set with respect to each minimum exposure unit on the outer side of the on region, and the exposure image data is corrected therewith.

Inventors:
SUGIMOTO SHIGETO (JP)
Application Number:
PCT/JP2018/037102
Publication Date:
July 11, 2019
Filing Date:
October 03, 2018
Export Citation:
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Assignee:
V TECH CO LTD (JP)
International Classes:
G03F7/20
Attorney, Agent or Firm:
EICHI PATENT & TRADEMARK CORP. (JP)
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