Title:
PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD FOR ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/015946
Kind Code:
A1
Abstract:
Provided is a pattern formation method that: includes (1) forming a film using an active light-sensitive or radiation-sensitive resin composition, (2) exposing the film to active light or radiation, and (3) developing the film that has been exposed to light using a developer liquid that contains an organic solvent; makes use of an active light-sensitive or radiation-sensitive resin composition containing a resin that comprises a repeating unit of a specific structure having an aromatic ring, a repeating unit of a specific structure having an acid-decomposable group, and a repeating unit of a specific structure having a crosslinkable group; and that simultaneously achieves high sensitivity, high resolution properties (high definition and the like), high roughness performance, film thinning reduction performance, high light exposure latitude, and high dry etching resistance at extremely high levels in a hyperfine area (for example, an area having a linear width of 50 nm or less). Also provided are an active light-sensitive or radiation-sensitive resin composition, a resist film, a production method for an electronic device using same, and an electronic device that make use of the pattern formation method.
Inventors:
TAKIZAWA HIROO (JP)
TSURUTA TAKUYA (JP)
TSUCHIMURA TOMOTAKA (JP)
TSURUTA TAKUYA (JP)
TSUCHIMURA TOMOTAKA (JP)
Application Number:
PCT/JP2014/066448
Publication Date:
February 05, 2015
Filing Date:
June 20, 2014
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/038; C08F212/14; G03F7/004; G03F7/039; G03F7/32; H01L21/027
Domestic Patent References:
| WO2012169620A1 | 2012-12-13 |
Foreign References:
| JP2013029554A | 2013-02-07 | |||
| JP2013140336A | 2013-07-18 | |||
| JP2013092590A | 2013-05-16 | |||
| JP2013083937A | 2013-05-09 | |||
| JP2013060537A | 2013-04-04 | |||
| JP2013054253A | 2013-03-21 | |||
| JP2012215826A | 2012-11-08 |
Attorney, Agent or Firm:
TAKAMATSU Takeshi et al. (JP)
Takamatsu 猛 (JP)
Takamatsu 猛 (JP)
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