PATTERN FORMATION METHOD, COMPOSITION FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PRODUCING ELECTRONIC DEVICE

WIPO Patent Application WO/2016/098809

A1

A pattern formation method including: (a) a step for applying a coating of an actinic ray-sensitive or a radiation-sensitive resin composition onto a substrate, and forming an actinic ray-sensitive or a radiation-sensitive film; (b) a step for applying a coating of a composition for protective film formation onto the actinic ray-sensitive or radiation-sensitive film, and forming a protective film; (c) a step for causing the actinic ray-sensitive or radiation-sensitive film coated with the protective film to be exposed to light; and (d) a step for developing the exposed actinic ray-sensitive or radiation-sensitive film with a developer containing an organic solvent. The protective film contains a resin (X) having a proton acceptor functional group.

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TANGO NAOHIRO (JP)
INOUE NAOKI (JP)
YAMAMOTO KEI (JP)
SHIRAKAWA MICHIHIRO (JP)
GOTO AKIYOSHI (JP)

PCT/JP2015/085206

June 23, 2016

December 16, 2015

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FUJIFILM CORP (JP)

G03F7/11; C08F220/34; G03F7/32; H01L21/027

JP2014056194A	2014-03-27
JP2013076974A	2013-04-25
JP2011221513A	2011-11-04
JPH07179754A	1995-07-18
JP2008033087A	2008-02-14
JP2015135492A	2015-07-27
JP2015129939A	2015-07-16
JP2015152782A	2015-08-24

KURATA, Masatoshi et al. (JP)
Masatoshi Kurata (JP)

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