Title:
PATTERN FORMATION METHOD AND PROCESS FOR PRODUCING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/194839
Kind Code:
A1
Abstract:
Provided is a pattern formation method which comprises, in the following order, a step (i) in which an actinic-ray-sensitive or radiation-sensitive resin composition is used to form a actinic-ray-sensitive or radiation-sensitive film, a step (ii) in which the film is irradiated with actinic rays or radiation, a step (iii) in which the film is developed with a first developing liquid comprising an organic solvent, thereby removing the low-exposure-amount areas and forming a negative pattern, a step (iv) in which the solubility of the medium-exposure-amount areas of the negative pattern in a second developing liquid is reduced, and a step (v) in which the resultant negative pattern is developed with the second developing liquid to remove the high-exposure-amount areas, thereby leaving the medium-exposure-amount areas only as a pattern. The actinic-ray-sensitive or radiation-sensitive resin composition contains a resin (A) which contains acid-decomposable groups and crosslinkable reactive groups.
Inventors:
FURUTANI HAJIME (JP)
NISHIO RYO (JP)
SHIRAKAWA MICHIHIRO (JP)
SHIBUYA AKINORI (JP)
NISHIO RYO (JP)
SHIRAKAWA MICHIHIRO (JP)
SHIBUYA AKINORI (JP)
Application Number:
PCT/JP2016/065786
Publication Date:
December 08, 2016
Filing Date:
May 27, 2016
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/40; G03F7/038; G03F7/039
Domestic Patent References:
| WO2015080041A1 | 2015-06-04 |
Foreign References:
| JP2015045836A | 2015-03-12 | |||
| JP2008292975A | 2008-12-04 | |||
| JP2008310314A | 2008-12-25 | |||
| JP2012242556A | 2012-12-10 | |||
| JP2013545142A | 2013-12-19 | |||
| JP2015031796A | 2015-02-16 | |||
| JP2012073401A | 2012-04-12 | |||
| JP2011191753A | 2011-09-29 | |||
| JP2016048373A | 2016-04-07 |
Attorney, Agent or Firm:
KURATA, Masatoshi et al. (JP)
Masatoshi Kurata (JP)
Masatoshi Kurata (JP)
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