Title:
PATTERN FORMING METHOD FOR LIQUID CRYSTAL ALIGNMENT OF ZENITHAL BI-STABLE LIQUID CRYSTAL PANEL, LIQUID CRYSTAL-ALIGNED SUBSTRATE INCLUDING PATTERN FORMED THEREBY, AND MASK SUBSTRATE USED IN FORMATION OF PATTERN
Document Type and Number:
WIPO Patent Application WO/2018/164388
Kind Code:
A1
Abstract:
Disclosed are a pattern forming method for liquid crystal alignment of a zenithal bi-stable liquid crystal panel, a liquid crystal-aligned substrate including a pattern formed thereby, and a mask substrate used in the formation of the pattern, the method forming an asymmetric pattern on a liquid crystal-aligned film of a zenithal bi-stable liquid crystal panel so as to maintain liquid crystal orientation even at zero potential after a voltage is applied, thereby enabling unnecessary power consumption to be prevented or minimized.
Inventors:
CHOO SO YOUNG (KR)
LEE JIN SOO (KR)
HER EUN KYU (KR)
SHIN BU GON (KR)
LEE JIN SOO (KR)
HER EUN KYU (KR)
SHIN BU GON (KR)
Application Number:
PCT/KR2018/001898
Publication Date:
September 13, 2018
Filing Date:
February 13, 2018
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
International Classes:
G02F1/1337
Foreign References:
| JPH11112014A | 1999-04-23 | |||
| KR20090054746A | 2009-06-01 | |||
| KR20150144936A | 2015-12-29 | |||
| JP2002287146A | 2002-10-03 | |||
| KR970004881B1 | 1997-04-08 | |||
| KR20170028839A | 2017-03-14 | |||
| KR20160039655A | 2016-04-11 |
Other References:
See also references of EP 3594741A4
Attorney, Agent or Firm:
PCR INTELLECTUAL PROPERTY LAW FIRM (KR)
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