Title:
PATTERN FORMING METHOD, METHOD FOR PRODUCING TRANSISTOR AND MEMBER FOR PATTERN FORMATION
Document Type and Number:
WIPO Patent Application WO/2019/117117
Kind Code:
A1
Abstract:
A pattern forming method for forming a pattern on an object surface to be processed, which comprises: a first layer formation step wherein a first layer that contains a compound having a protecting group, which is decomposable by means of an acid and is also decomposable by means of light, is formed on the surface to be processed; a second layer formation step wherein a second layer that contains a photoacid generator which produces an acid by means of light exposure is formed on the first layer; a light exposure step wherein the first layer and the second layer are exposed to light, thereby forming a latent image, which is composed of an exposed region and an unexposed region, in the first layer; and an arrangement step wherein a pattern forming material is arranged in the exposed region or in the unexposed region.
Inventors:
KAWAKAMI YUSUKE (JP)
Application Number:
PCT/JP2018/045417
Publication Date:
June 20, 2019
Filing Date:
December 11, 2018
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F7/004; C07F7/18; G03F7/09; G03F7/095; G03F7/20
Domestic Patent References:
| WO2015029981A1 | 2015-03-05 |
Foreign References:
| JP2005345649A | 2005-12-15 | |||
| JP2017120342A | 2017-07-06 | |||
| JP2010215818A | 2010-09-30 | |||
| JP2011006557A | 2011-01-13 | |||
| JP2010265366A | 2010-11-25 |
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
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