Title:
PATTERN-FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2010/064386
Kind Code:
A1
Abstract:
Disclosed is a pattern-forming method which comprises a pattern-forming step wherein a solution that is obtained by dissolving a reactive substance, which is caused to chemically react by electromagnetic waves, ions or electrons, into an ionic liquid, is irradiated with electromagnetic waves, ions or electrons, so that a chemical reaction of the reactive substance is caused and the reaction product is deposited on the irradiated portion, thereby forming a pattern of the reaction product. Consequently, a fine pattern can be formed by simple processes in the pattern-forming method.
Inventors:
KUWABATA, Susumu (())
桑畑進 (())
SEKI, Shuhei (())
関修平 (())
IMANISHI, Akihito (())
桑畑進 (())
SEKI, Shuhei (())
関修平 (())
IMANISHI, Akihito (())
Application Number:
JP2009/006386
Publication Date:
June 10, 2010
Filing Date:
November 26, 2009
Export Citation:
Assignee:
OSAKA UNIVERSITY (1-1 Yamadaoka, Suita-shi Osaka, 71, 〒5650871, JP)
国立大学法人大阪大学 (〒71 大阪府吹田市山田丘１番１号 Osaka, 〒5650871, JP)
NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY (1 Furo-cho, Chikusa-ku Nagoya-sh, Aichi 01, 〒4648601, JP)
国立大学法人名古屋大学 (〒01 愛知県名古屋市千種区不老町１番 Aichi, 〒4648601, JP)
KUWABATA, Susumu (())
桑畑進 (())
SEKI, Shuhei (())
国立大学法人大阪大学 (〒71 大阪府吹田市山田丘１番１号 Osaka, 〒5650871, JP)
NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY (1 Furo-cho, Chikusa-ku Nagoya-sh, Aichi 01, 〒4648601, JP)
国立大学法人名古屋大学 (〒01 愛知県名古屋市千種区不老町１番 Aichi, 〒4648601, JP)
KUWABATA, Susumu (())
桑畑進 (())
SEKI, Shuhei (())
International Classes:
B05D3/06; B05D7/24; H01B13/00; H05K3/10
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (Daiwa Minamimorimachi Building, 2-6 Tenjinbashi 2-chome Kita,Kita-ku, Osaka-shi, Osaka 41, 〒5300041, JP)
Download PDF:
Previous Patent: PACKAGE FOR STORING MINUTE SOLDER BALL AND METHOD FOR STORING MINUTE SOLDER BALL
Next Patent: DISPLAY INPUT DEVICE
Next Patent: DISPLAY INPUT DEVICE