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Title:
PATTERN INSPECTION DEVICE AND METHOD OF ACQUIRING ALIGNMENT QUANTITY BETWEEN CONTOUR LINES
Document Type and Number:
WIPO Patent Application WO/2022/024499
Kind Code:
A1
Abstract:
A pattern inspection device of one embodiment of the present invention is characterized by comprising: an actual contour line image creation circuit for creating an actual contour line image of a predetermined region including a plurality of actual contour locations on an actual contour line of a graphic pattern in an image to be inspected, a gradation value of each pixel inside the predetermined region being defined by a predetermined function dependent on the distance from the center of the pixel itself to the closest actual contour location among the plurality of actual contour locations; a reference contour line image creation circuit for creating a reference contour line image of the predetermined region, a gradation value of each pixel inside the predetermined region being defined by a predetermined function dependent on the distance from the center of the pixel itself to a closest reference contour location among a plurality of reference contour locations on a reference contour line for comparing against the actual contour line; and an alignment quantity calculation circuit for using the gradation difference between the actual contour line image and the reference contour line image to calculate an alignment quantity for aligning the actual contour line image and the reference contour line image.

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Inventors:
SUGIHARA SHINJI (JP)
Application Number:
PCT/JP2021/018380
Publication Date:
February 03, 2022
Filing Date:
May 14, 2021
Export Citation:
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Assignee:
NUFLARE TECHNOLOGY INC (JP)
International Classes:
G01N23/2251; G01N21/956; G06T1/00; G06T7/00
Foreign References:
JP2019039808A2019-03-14
JP2008151568A2008-07-03
JP2004163420A2004-06-10
JP2001175857A2001-06-29
JPH11201908A1999-07-30
US20190206024A12019-07-04
US20160292840A12016-10-06
US6141038A2000-10-31
Attorney, Agent or Firm:
IKEGAMI, Tetsuma et al. (JP)
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