Title:
PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD
Document Type and Number:
WIPO Patent Application WO/2011/129364
Kind Code:
A1
Abstract:
Disclosed as a pattern inspection device (1) that inspects bit patterns of a disc medium (4), formed with a plurality of concentric tracks, with the shape of each track pattern spaced for each one-bit in a radial direction and a circumferential direction, equipped with a rotating stage (14) mounted by the disc medium; a radiating optical system (2) that radiates an electron beam at the disc medium (4) that rotates along with the rotating stage (14); and an electron detector (3) that detects electrons generated from the disc medium (4) on the rotating stage (14) by radiating the electron beam using the radiating optical system (2); this inspects patterns by setting a spot diameter of the electron beam by the radiating optical system (2) to be larger than the bit pattern diameter.
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Inventors:
YAMASHITA Hiroshi (C/O HOYA CORPORATION, 7-5 Nakaochiai 2-chome, Shinjuku-k, Tokyo 25, 〒1618525, JP)
Application Number:
JP2011/059178
Publication Date:
October 20, 2011
Filing Date:
April 13, 2011
Export Citation:
Assignee:
HOYA CORPORATION (7-5 Nakaochiai 2-chome, Shinjuku-ku Tokyo, 25, 〒1618525, JP)
ＨＯＹＡ株式会社 (〒25 東京都新宿区中落合二丁目７番５号 Tokyo, 〒1618525, JP)
ＨＯＹＡ株式会社 (〒25 東京都新宿区中落合二丁目７番５号 Tokyo, 〒1618525, JP)
International Classes:
G11B5/84; H01J37/22
Attorney, Agent or Firm:
ANIYA Setuo et al. (21 TOWA BLDG. 3F, 6-1 Iidabashi 4-chome, Chiyoda-k, Tokyo 72, 〒1020072, JP)
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Claims:
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