Title:
PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD
Document Type and Number:
WIPO Patent Application WO/2021/235076
Kind Code:
A1
Abstract:
A pattern inspection device according to an embodiment of the present invention is characterized by comprising a deflector for deflecting multiple primary electron beams and a detector for detecting multiple secondary electron beams, and being provided with: a secondary electron image acquisition mechanism for acquiring secondary electron images corresponding to respective primary electron beams, by using the deflector to scan, with the multiple primary electron beams, on a sample surface on which a pattern is formed, and using the detector to detect the multiple secondary electron beams emitted from the sample surface; a storage device for storing individual correction kernels created such that the secondary electron images of a reference pattern which are corresponding to the respective primary electron beams match with a prescribed reference blurred image; a correction circuit for correcting, by using the respective individual correction kernels, the secondary electron images corresponding to the respective primary electron beams obtained from an inspection sample; and a comparison circuit for comparing an inspection image composed of at least a part of the corrected secondary electron images with a reference image.
Inventors:
SHIRATSUCHI MASATAKA (JP)
NODA CHOSAKU (JP)
SUGIMORI TADAYUKI (JP)
NODA CHOSAKU (JP)
SUGIMORI TADAYUKI (JP)
Application Number:
PCT/JP2021/011925
Publication Date:
November 25, 2021
Filing Date:
March 23, 2021
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC (JP)
International Classes:
H01J37/28; G01N23/2251
Domestic Patent References:
| WO2019021536A1 | 2019-01-31 |
Foreign References:
| JP2019204694A | 2019-11-28 | |||
| US20200126751A1 | 2020-04-23 | |||
| JP2020144010A | 2020-09-10 |
Attorney, Agent or Firm:
IKEGAMI, Tetsuma et al. (JP)
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