PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD

WIPO Patent Application WO/2022/014136

A1

A pattern inspection device according to an embodiment of this invention is characterized by comprising: an image acquisition mechanism for acquiring an image under inspection of a substrate having a graphic pattern formed thereon; a distortion coefficient calculation circuit for using a plurality of actual image contour positions on an actual image contour of the graphic pattern in the image under inspection and reference contour positions on a reference contour for comparison with the actual image contour to calculate coefficients of the distortion of the plurality of actual image contour positions resulting from the distortion of the image under inspection such that the distortion coefficients are weighted in a prescribed direction; a distortion vector estimation circuit for using the distortion coefficients to estimate distortion vectors for each actual image contour position from among the plurality of actual image contour positions; and a comparison circuit for using the distortion vectors for each actual image contour position to compare the actual image contour and the reference contour.

SUGIHARA SHINJI (JP)

PCT/JP2021/018379

January 20, 2022

May 14, 2021

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NUFLARE TECHNOLOGY INC (JP)

G01B15/04; G01N21/956; G01N23/2251; G06T1/00; G06T7/00; H01L21/66

WO2011148975A1

2011-12-01

JP2013246162A	2013-12-09
JP2006014292A	2006-01-12
JP2013190418A	2013-09-26
JP2007149055A	2007-06-14

IKEGAMI, Tetsuma et al. (JP)

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