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Title:
PATTERN MATCHING METHOD AND PATTERN MATCHING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2011/048758
Kind Code:
A1
Abstract:
Provided is a pattern matching method and a pattern matching apparatus, wherein the degree of matching between a template and the actual image upon template matching is maintained at a high level, without depending on a partial projection of a lower layer. Proposed, as one embodiment, is a method and apparatus for template matching, wherein either an area is set in which verification of the template and the image is not conducted, or a second area is set inside the template wherein verification different from verification conducted in a first verification area is to be conducted, and the template matching is conducted on the basis either of verification excluding the non-verification area, or of verification using the first and second areas.

Inventors:
NAGATOMO, Wataru (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
長友 渉 (〒04 茨城県ひたちなか市大字市毛882番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
ABE, Yuichi (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
Application Number:
JP2010/005976
Publication Date:
April 28, 2011
Filing Date:
October 06, 2010
Export Citation:
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Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社 日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目24番14号 Tokyo, 〒1058717, JP)
NAGATOMO, Wataru (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
長友 渉 (〒04 茨城県ひたちなか市大字市毛882番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
International Classes:
G06T7/00; G01B15/00
Attorney, Agent or Firm:
INOUE, Manabu et al. (6-1, Marunouchi 1-chome, Chiyoda-k, Tokyo 20, 〒1008220, JP)
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