Title:
PATTERN MATCHING METHOD AND PATTERN MATCHING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2011/048758
Kind Code:
A1
Abstract:
Provided is a pattern matching method and a pattern matching apparatus, wherein the degree of matching between a template and the actual image upon template matching is maintained at a high level, without depending on a partial projection of a lower layer. Proposed, as one embodiment, is a method and apparatus for template matching, wherein either an area is set in which verification of the template and the image is not conducted, or a second area is set inside the template wherein verification different from verification conducted in a first verification area is to be conducted, and the template matching is conducted on the basis either of verification excluding the non-verification area, or of verification using the first and second areas.
Inventors:
NAGATOMO WATARU (JP)
ABE YUICHI (JP)
IKEDA MITSUJI (JP)
ABE YUICHI (JP)
IKEDA MITSUJI (JP)
Application Number:
PCT/JP2010/005976
Publication Date:
April 28, 2011
Filing Date:
October 06, 2010
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
NAGATOMO WATARU (JP)
ABE YUICHI (JP)
IKEDA MITSUJI (JP)
NAGATOMO WATARU (JP)
ABE YUICHI (JP)
IKEDA MITSUJI (JP)
International Classes:
G06T7/00; G01B15/00
Foreign References:
| JP2005061837A | 2005-03-10 | |||
| JP2005106477A | 2005-04-21 | |||
| JPH0637161A | 1994-02-10 | |||
| JPH1021393A | 1998-01-23 | |||
| JP2006300848A | 2006-11-02 |
Attorney, Agent or Firm:
INOUE, Manabu et al. (JP)
Manabu Inoue (JP)
Manabu Inoue (JP)
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