Title:
PATTERN MEASUREMENT DEVICE AND COMPUTER PROGRAM
Document Type and Number:
WIPO Patent Application WO/2015/083675
Kind Code:
A1
Abstract:
The present invention is: a pattern measurement device that, regardless of increased fineness, deviation, or the like of a pattern, accurately and stably performs a measurement on the basis of an edge identification or a pattern or edge judgment; and a computer program. The pattern measurement device classifies pattern sites (G1, G2, G3, G4), which are repeatedly arrayed at a specific interval, in accordance with the position of the pattern sites, and executes a pattern edge type identification, a pattern type identification, or a measurement of the dimensions between predetermined pattern sites on the basis of an association between the classified pattern sites and information pertaining to the pattern edge type or information pertaining to the pattern type. The computer program causes a computer to execute the abovementioned process.
Inventors:
NAMAI HITOSHI (JP)
YAMAZAKI TOMOAKI (JP)
YAMAZAKI TOMOAKI (JP)
Application Number:
PCT/JP2014/081802
Publication Date:
June 11, 2015
Filing Date:
December 01, 2014
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
G01B15/00
Foreign References:
| JP2012519391A | 2012-08-23 | |||
| JP2010249587A | 2010-11-04 | |||
| JP2011133378A | 2011-07-07 |
Attorney, Agent or Firm:
TSUTSUI, YAMATO (JP)
Tsutsui Daiwa (JP)
Tsutsui Daiwa (JP)
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