Title:
PATTERN MEASUREMENT DEVICE, AND COMPUTER PROGRAM
Document Type and Number:
WIPO Patent Application WO/2018/061135
Kind Code:
A1
Abstract:
A purpose of the present invention is to provide a pattern measurement device that allows the selection of device parameters for calculating proper variability and allows the estimation of proper variability. The present invention provides a pattern measurement device comprising a computation processing device that, on the basis of a plurality of measured values acquired by a charged particle radiation device, calculates the variability of the measured values of a pattern that is the object of measurement, said pattern measurement device characterized in that a variability σmeasured of the plurality of measured values formed at different locations and σ2
observed=σ2
pattern0/Np+σ2
sem0/(Np∙Nframe) are used to calculate σSEM0, which indicates measurement reproducibility error. σpattern0 is the variability due to pattern shape error, Np is the number of measurement points, and Nframe is a value that changes according to device parameters.
Inventors:
FUKUDA HIROSHI (JP)
Application Number:
PCT/JP2016/078749
Publication Date:
April 05, 2018
Filing Date:
September 29, 2016
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
G01B15/04; G01B15/00
Foreign References:
| JP2006215020A | 2006-08-17 | |||
| JP2007248087A | 2007-09-27 | |||
| JP2013004672A | 2013-01-07 |
Attorney, Agent or Firm:
TODA Yuji (JP)
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