Title:
PATTERN MEASUREMENT METHOD AND PATTERN MEASUREMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/002341
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a pattern measurement method and pattern measurement device for achieving highly accurate measurement in the depth direction of a pattern. The present invention is a pattern measurement method and a device for implementing the pattern measurement, the pattern measurement method having the following steps: a focused ion beam is irradiated so as to form an inclined surface in a sample area including a circuit element having deep holes, deep grooves, or a three-dimensional structure; the field of view of a scanning electron microscope is set so as to include the boundary between the inclined surface and a sample surface; an image of the field of view is obtained on the basis of a detection signal obtained through the scanning of an electron beam over the field of view; the acquired image is used to specify a first position that is the boundary between the inclined surface and a non-inclined surface and a second position that is the position of a desired deep hole or deep groove positioned within the inclined surface; and the height of a pattern composing the circuit element having deep holes, deep grooves, or a three-dimensional structure is determined on the basis of the distance in the sample surface direction between the first position and second position and the angle of the inclined surface.
Inventors:
KAWADA HIROKI (JP)
SAKAI HIDEO (JP)
SASADA KATSUHIRO (JP)
SAKAI HIDEO (JP)
SASADA KATSUHIRO (JP)
Application Number:
PCT/JP2015/063412
Publication Date:
January 07, 2016
Filing Date:
May 11, 2015
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
G01B15/00; H01J37/28; H01J37/317; H01L21/66
Foreign References:
| US20130186747A1 | 2013-07-25 | |||
| JP2008070155A | 2008-03-27 | |||
| JP2006132975A | 2006-05-25 | |||
| JP2006294354A | 2006-10-26 | |||
| JP2002333412A | 2002-11-22 |
Attorney, Agent or Firm:
INOUE Manabu et al. (JP)
Manabu Inoue (JP)
Manabu Inoue (JP)
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