Title:
PATTERN MEASURING APPARATUS AND COMPUTER PROGRAM
Document Type and Number:
WIPO Patent Application WO/2010/119641
Kind Code:
A1
Abstract:
Provided are a pattern measuring apparatus and a computer program which determine whether a gap formed in a sample (201) is a core gap (211) or a spacer gap (212).
The secondary electron profile of the sample (201) is acquired, the feature quantities of the secondary electron profile at the positions of edges (303, 305) are detected, and based on the detected feature quantities, whether each gap adjacent to each of the edges (303, 305) is the core gap (211) or the spacer gap (212) is determined.
Furthermore, the waveform profile of the spacer (207) is previously stored, the secondary electron profile of the sample (201) is acquired, a matching degree of the secondary electron profile and the stored waveform profile at the position of each spacer (207) is detected, and based on the detected matching degree, whether the each gap adjacent to each spacer (207) is the core gap (211) or the spacer gap (212) is determined.
Inventors:
MOCHIZUKI YUZURU (JP)
TANAKA MAKI (JP)
ISAWA MIKI (JP)
YAMAGUCHI SATORU (JP)
TANAKA MAKI (JP)
ISAWA MIKI (JP)
YAMAGUCHI SATORU (JP)
Application Number:
PCT/JP2010/002524
Publication Date:
October 21, 2010
Filing Date:
April 07, 2010
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
MOCHIZUKI YUZURU (JP)
TANAKA MAKI (JP)
ISAWA MIKI (JP)
YAMAGUCHI SATORU (JP)
MOCHIZUKI YUZURU (JP)
TANAKA MAKI (JP)
ISAWA MIKI (JP)
YAMAGUCHI SATORU (JP)
International Classes:
G01B15/04; H01L21/027
Foreign References:
| JP2008118033A | 2008-05-22 | |||
| JP2001147113A | 2001-05-29 | |||
| JP2007129059A | 2007-05-24 | |||
| JP2003037139A | 2003-02-07 | |||
| JPH03266444A | 1991-11-27 |
Attorney, Agent or Firm:
INOUE, MANABU (JP)
Manabu Inoue (JP)
Manabu Inoue (JP)
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