Title:
PATTERN MEASURING APPARATUS AND COMPUTER PROGRAM
Document Type and Number:
WIPO Patent Application WO/2011/077644
Kind Code:
A1
Abstract:
Disclosed is a pattern measuring apparatus which can identify the kind of a gap formed in a manufacture process having a plurality of exposure steps, such as SADP, with high accuracy and high throughput. Specifically disclosed is a pattern measuring apparatus which can suitably assess a gap even if a sample has the gap that is not easily assessed.
A feature quantity relating to one end side of a pattern having a plurality of patterns disposed therein, and a plurality of kinds of feature quantities relating to the other end side of the pattern are extracted from signals detected on the basis of charged particle beam scanning. With respect to suitable kinds of feature quantities among the plurality of kinds of the feature quantities, the feature quantity on the one end side of the pattern and that on the other end side of the pattern are compared with each other. On the basis of the comparison, the kinds of the spaces among the patterns are determined.
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Inventors:
SAKAI, Kei (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
酒井 計 (〒04 茨城県ひたちなか市大字市毛882番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
ZHANG, Yafeng (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
酒井 計 (〒04 茨城県ひたちなか市大字市毛882番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
ZHANG, Yafeng (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
Application Number:
JP2010/006997
Publication Date:
June 30, 2011
Filing Date:
December 01, 2010
Export Citation:
Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社 日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目24番14号 Tokyo, 〒1058717, JP)
SAKAI, Kei (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
酒井 計 (〒04 茨城県ひたちなか市大字市毛882番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
株式会社 日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目24番14号 Tokyo, 〒1058717, JP)
SAKAI, Kei (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
酒井 計 (〒04 茨城県ひたちなか市大字市毛882番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
International Classes:
G01B15/04; H01L21/027; H01L21/66
Attorney, Agent or Firm:
INOUE, Manabu et al. (6-1, Marunouchi 1-chome, Chiyoda-k, Tokyo 20, 〒1008220, JP)
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