Title:
PATTERN POSITION DETECTION METHOD, PATTERN POSITION DETECTION SYSTEM, AND IMAGE QUALITY ADJUSTMENT TECHNIQUE USING PATTERN POSITION DETECTION METHOD AND PATTERN POSITION DETECTION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2014/128821
Kind Code:
A1
Abstract:
[Problem] To provide a pattern position detection method that enables the position of an alignment pattern to be detected in a highly-precise manner. [Solution] In this pattern position detection method, a pattern is displayed on a liquid crystal panel (2) and captured by a camera (3), and a black image is displayed on the liquid crystal panel (2) and is captured by the camera (3) at the same shutter speed or F-value used when the pattern was captured; and the position of an image of the pattern on the imaging area of the camera (3) is detected on the basis of the differences between the captured image of the pattern and the captured image of the black image.
Inventors:
MURASE HIROSHI (JP)
IMOTO MASAYOSHI (JP)
IMOTO MASAYOSHI (JP)
Application Number:
PCT/JP2013/053918
Publication Date:
August 28, 2014
Filing Date:
February 19, 2013
Export Citation:
Assignee:
IIX INC (JP)
International Classes:
H04N9/30; G09G5/00; G09G5/02; G09G5/10
Domestic Patent References:
| WO2005057941A1 | 2005-06-23 |
Foreign References:
| JP2008145471A | 2008-06-26 | |||
| JP2005151418A | 2005-06-09 | |||
| JP2002064688A | 2002-02-28 |
Attorney, Agent or Firm:
MATSUDA Junichi et al. (JP)
Matsuda Junichi (JP)
Matsuda Junichi (JP)
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