Title:
PATTERNED HIGH DENSITY MAGNETIC RECORDING MEDIUM AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2001/026101
Kind Code:
A1
Abstract:
A patterned high density magnetic recording medium which is characterized in that the arrangement of recessed trenches are formed in a matrix thin film covering a medium substrate or in the medium substrate by etching, and the recessed in the trench arrangement are filled with a magnetic material up to the height of the matrix thin film surface or the medium substrate surface to form the arrangement of magnetic bits; and a streamlined manufacturing process of the patterned medium which is excellent in productivity, has a streamlined construction and has little environmental load.
Inventors:
NAKATANI ISAO (JP)
Application Number:
PCT/JP2000/006964
Publication Date:
April 12, 2001
Filing Date:
October 05, 2000
Export Citation:
Assignee:
JAPAN SCIENCE & TECH CORP (JP)
JP NAT RES INST FOR METALS (JP)
NAKATANI ISAO (JP)
JP NAT RES INST FOR METALS (JP)
NAKATANI ISAO (JP)
International Classes:
G03F7/00; G03F7/40; G11B5/64; G11B5/65; G11B5/73; G11B5/84; G11B5/85; G03F7/09; (IPC1-7): G11B5/85; G11B5/65; H01F10/00
Foreign References:
| JPH02201732A | 1990-08-09 | |||
| JPH0340219A | 1991-02-21 | |||
| JPH08203058A | 1996-08-09 |
Attorney, Agent or Firm:
Nishizawa, Toshio (6th floor 37-10, Udagawa-cho Shibuya-ku Tokyo, JP)
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