Title:
PATTERNING LAYERS COMPRISED OF SPIN-ON CERAMIC FILMS
Document Type and Number:
WIPO Patent Application WO2004068551
Kind Code:
A3
Abstract:
The present invention comprises a method for forming a hardmask including the steps of depositing a polymeric preceramic precursor film atop a substrate; converting the polymeric preceramic precursor film into at least one ceramic layer, where the ceramic layer has a composition of SivNWCXOyHZ where 0.1<= v<= 0.9, 0<=w< 0.5, 0.05<= x<= 0.9, 0<= y<= 0.5, 0.05<= z<= 0.8 for v+w+x+y+z=l; forming a patterned photoresist atop the ceramic layer; patterning the ceramic layer to expose regions of the underlying substrate, where a remaining region of the underlying substrate is protected by the patterned ceramic layer; and etching the exposed region of the underlying substrate. Another aspect of the present invention is a buried etch stop layer having a composition of SivNWCXOyHZ where 0.05
Inventors:
GATES STEPHEN M (US)
HEDRICK JEFFREY C (US)
HUANG ELBERT E (US)
PFEIFFER DIRK (US)
HEDRICK JEFFREY C (US)
HUANG ELBERT E (US)
PFEIFFER DIRK (US)
Application Number:
PCT/US2004/002126
Publication Date:
May 26, 2005
Filing Date:
January 26, 2004
Export Citation:
Assignee:
IBM (US)
GATES STEPHEN M (US)
HEDRICK JEFFREY C (US)
HUANG ELBERT E (US)
PFEIFFER DIRK (US)
GATES STEPHEN M (US)
HEDRICK JEFFREY C (US)
HUANG ELBERT E (US)
PFEIFFER DIRK (US)
International Classes:
G03G13/06; H01L21/00; H01L21/311; H01L21/312; H01L21/316; H01L21/44; H01L23/48; H05B6/64; H01L; (IPC1-7): H05B6/64
Foreign References:
| US6699810B2 | 2004-03-02 |
Other References:
See also references of EP 1595276A4
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