PELLICLE FILM, PELLICLE FRAME BODY, PELLICLE, AND METHOD FOR MANUFACTURING PELLICLE

Title:

PELLICLE FILM, PELLICLE FRAME BODY, PELLICLE, AND METHOD FOR MANUFACTURING PELLICLE

Document Type and Number:

WIPO Patent Application WO/2018/003603

Kind Code:

A1

Abstract:

Provided are: a pellicle film for extreme ultraviolet (EUV), said pellicle film having reduced adhesion of dust and the like; a pellicle frame body; a pellicle; and a method for manufacturing the pellicle. In this method for manufacturing a pellicle, a pellicle film (202) is formed on a substrate (200), a metal mask (204) is formed on the substrate surface on the reverse side of the surface on which the pellicle film is formed, a part of the substrate is removed from the metal mask side, and the metal mask is removed. According to one embodiment of the present invention, the present invention is capable of providing a pellicle film for EUV, said pellicle film having reduced adhesion of dust and the like, a pellicle frame body, a pellicle, and a method for manufacturing the pellicle.

Inventors:

OKUBO ATSUSHI (JP)
ONO YOSUKE (JP)
KOHMURA KAZUO (JP)
FUJII YASUHISA (JP)
YOSHIKAWA WATARU (JP)

Application Number:

PCT/JP2017/022688

Publication Date:

January 04, 2018

Filing Date:

June 20, 2017

Export Citation:

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Assignee:

MITSUI CHEMICALS INC (JP)

International Classes:

G03F1/62; G03F7/20

Domestic Patent References:

WO2016043301A1

2016-03-24

Foreign References:

JP2010541267A	2010-12-24
JP2001133959A	2001-05-18
US9057957B2	2015-06-16
JPH0342153U	1991-04-22
JP2013004893A	2013-01-07
JP2013004893A	2013-01-07
JPS6339703U	1988-03-15

Other References: