Title:
PELLICLE FRAME, PELLICLE, PELLICLE-ATTACHED EXPOSURE ORIGINAL PLATE, METHOD FOR MANUFACTURING SEMICONDUCTOR, METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY PLATE, AND EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2021/230262
Kind Code:
A1
Abstract:
The present invention provides: a pellicle frame for EUV exposure characterized in that the pellicle frame is provided with at least one ventilation part, and a filter having a porous membrane coated with a resin is attached inside the ventilation part; a pellicle characterized in that a pellicle film is stretched on the pellicle frame; a pellicle-attached exposure original plate for EUV exposure characterized in that the pellicle is attached to the exposure original plate; a method for manufacturing a semiconductor; a method for manufacturing a liquid crystal display plate; and an exposure method. The pellicle frame of the present invention is sufficiently resistant to hydrogen radicals during EUV exposure.
Inventors:
YANASE YU (JP)
Application Number:
PCT/JP2021/017960
Publication Date:
November 18, 2021
Filing Date:
May 12, 2021
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
G03F1/64
Domestic Patent References:
| WO2018116517A1 | 2018-06-28 | |||
| WO2016043292A1 | 2016-03-24 |
Foreign References:
| JP2016191902A | 2016-11-10 | |||
| JP2000305254A | 2000-11-02 | |||
| JP2016524184A | 2016-08-12 | |||
| JP2007333910A | 2007-12-27 |
Attorney, Agent or Firm:
PATENT PROFESSIONAL CORPORATION EI-MEI PATENT OFFICE (JP)
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