Title:
PELLICLE FRAME, AND PELLICLE
Document Type and Number:
WIPO Patent Application WO/2023/074899
Kind Code:
A1
Abstract:
[Problem] The objective of the present invention is to provide a pellicle frame, and a pellicle employing the same, which prevents the discharge and generation of debris and foreign matter remaining on a frame during processing to create the frame, and which is capable of suppressing the generation of newly-occurring debris and foreign matter during transfer, storage, or use, for example, and with which, even if debris or foreign matter becomes attached to the frame, the debris or foreign matter can easily be washed off. [Solution] The present invention provides a pellicle frame and a pellicle including the pellicle frame, the pellicle frame comprising a frame base material comprising Ti or a Ti alloy, and a metal layer laminated onto a surface of the frame base material, wherein: the metal layer includes one or a plurality of layers; the surface of the pellicle frame includes an outermost surface layer of the metal layer, and when the surface of the outermost surface layer is measured at a magnification of 1200 times using a laser microscope in conformance with JIS B0601, an arithmetic mean roughness Ra of at least an inner side surface is in a range of 0.10 μm or less.
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Inventors:
KUBOTA YOSHIHIRO (JP)
YANASE YU (JP)
YANASE YU (JP)
Application Number:
PCT/JP2022/040734
Publication Date:
May 04, 2023
Filing Date:
October 31, 2022
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
G03F1/64; G03F1/84; G03F7/20
Domestic Patent References:
| WO2021157539A1 | 2021-08-12 | |||
| WO2020008977A1 | 2020-01-09 |
Foreign References:
| JPH0772617A | 1995-03-17 | |||
| US5419972A | 1995-05-30 | |||
| JPH06130654A | 1994-05-13 | |||
| JPH11167198A | 1999-06-22 |
Attorney, Agent or Firm:
SHIMAZAKI Eiichiro (JP)
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