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Patent Searching and Data


Title:
PELLICLE AND METHOD FOR PRODUCING PELLICLE
Document Type and Number:
WIPO Patent Application WO/2019/031361
Kind Code:
A1
Abstract:
Provided are: a pellicle (1) which is capable of improving the production yield; and a method for producing a pellicle. This method for producing a pellicle comprises: a step for preparing a supporting body (3) that contains Si; and a step for forming a pellicle film (4) on the surface of the supporting body. The step for forming a pellicle film comprises: a step for forming an SiC film (121) that has a first average carbon concentration on the surface of the supporting body by carbonizing Si in the surface of the supporting body; and a step for forming an SiC film (122) that has a second average carbon concentration which is different from the first average carbon concentration on the surface of the SiC film. This method for producing a pellicle additionally comprises a step for having at least a part of the back surface of an SiC film (12) exposed by means of wet etching.

Inventors:
OKU HIDEHIKO (JP)
HIDE ICHIRO (JP)
Application Number:
PCT/JP2018/028904
Publication Date:
February 14, 2019
Filing Date:
August 01, 2018
Export Citation:
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Assignee:
AIR WATER INC (JP)
International Classes:
G03F1/62; G03F1/64
Domestic Patent References:
WO2014188710A12014-11-27
WO2017141835A12017-08-24
WO2017213264A12017-12-14
WO2014188710A12014-11-27
Foreign References:
JPH09310170A1997-12-02
JPH06216050A1994-08-05
JP2017083791A2017-05-18
JP2002025916A2002-01-25
JP2018035014A2018-03-08
JP2017083791A2017-05-18
JPH09310170A1997-12-02
Other References:
See also references of EP 3667417A4
Attorney, Agent or Firm:
TSUBAKI, Yutaka (JP)
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