Title:
PELLICLE, ORIGINAL PLATE FOR LIGHT EXPOSURE, LIGHT EXPOSURE DEVICE, METHOD FOR PRODUCING PELLICLE, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/210731
Kind Code:
A1
Abstract:
Provided is a pellicle with which it is possible to minimize damage to a pellicle film due to the pressure difference between the inside and outside of the pellicle. A pellicle (10A) includes a pellicle film (11A) and a support frame (12A) having an open portion (H12A). The pellicle film has a self-supporting film area (RA) covering the open portion. The self-supporting film area includes an exposure area (RA1) and a peripheral edge area (RA2) surrounding the exposure area. The peripheral edge area has a thick film part (Ta) of greater thickness than that of the exposure area. The pellicle satisfies conditions (i) or (ii) below. (i) The support frame is a rectangular frame body and the thick film part is positioned at least in a pair of designated long-side areas in the peripheral edge area. (ii) The support frame is a square frame body and the thick film part is positioned at least in a pair of designated first center areas and a pair of designated second center areas within the peripheral edge area.
Inventors:
ONO YOUSUKE (JP)
Application Number:
PCT/JP2022/015525
Publication Date:
October 06, 2022
Filing Date:
March 29, 2022
Export Citation:
Assignee:
MITSUI CHEMICALS INC (JP)
International Classes:
G03F1/62
Domestic Patent References:
| WO2018008594A1 | 2018-01-11 | |||
| WO2006011655A1 | 2006-02-02 |
Foreign References:
| US20190204732A1 | 2019-07-04 | |||
| JP2020160345A | 2020-10-01 | |||
| JP2019168502A | 2019-10-03 | |||
| JP2016114820A | 2016-06-23 | |||
| JP2015178250A | 2015-10-08 | |||
| JP2021061642A | 2021-04-15 |
Other References:
SAITO ET AL., J. NANOSCI. NANOTECHNOL., vol. 8, 2008, pages 6153 - 6157
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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