Title:
PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS
Document Type and Number:
WIPO Patent Application WO2002082185
Kind Code:
B1
Abstract:
A photoacid compound having general structure: R-O(CF2)nSO3X wherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C1-C12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q- wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.
Inventors:
FERREIRA LAWRENCE
BLAKENEY ANDREW J
SPAZIANO GREGORY DOMINIC
DIMOV OGNIAN
KOCAB THOMAS J
HATFIELD JOHN P
BLAKENEY ANDREW J
SPAZIANO GREGORY DOMINIC
DIMOV OGNIAN
KOCAB THOMAS J
HATFIELD JOHN P
Application Number:
PCT/US2002/010800
Publication Date:
December 27, 2002
Filing Date:
April 05, 2002
Export Citation:
Assignee:
ARCH SPEC CHEM INC (US)
International Classes:
C07C309/10; C07C321/28; C07C323/20; C07C381/12; C07D207/40; C07D209/94; C07D333/46; G03F7/004; G03F7/039; (IPC1-7): G03F7/004; C07C303/00; C07C309/01; C07C309/02; C07C309/06; C07C309/63
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