Title:
PERIODIC PATTERN FORMING METHOD AND DEVICE EMPLOYING SELF-ASSEMBLED BLOCK COPOLYMER
Document Type and Number:
WIPO Patent Application WO/2013/146538
Kind Code:
A1
Abstract:
A periodic pattern forming method in which a first polymer and a second polymer of a block copolymer self-assemble and a periodic pattern is formed in a guide layer (210) comprises: a first etching step of etching, with a plasma which is generated from a first gas, the second polymer; a first film forming step of, after the first etching step, forming, on the surface of the first polymer other than the second polymer etching portion and the guide layer, with a plasma which is generated from a second gas, a first protection film (270); and a second etching step of, after the first film forming step, further etching the second polymer with the plasma which is generated from the first gas.
Inventors:
NISHIMURA EIICHI (JP)
YAMASHITA FUMIKO (JP)
NIITSUMA SATOKO (JP)
YAMASHITA FUMIKO (JP)
NIITSUMA SATOKO (JP)
Application Number:
PCT/JP2013/058100
Publication Date:
October 03, 2013
Filing Date:
March 21, 2013
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/3065; B82Y30/00; B82Y40/00; H01L21/027
Foreign References:
| JP2011080087A | 2011-04-21 | |||
| JP2011134856A | 2011-07-07 |
Other References:
YUK-HONG TING ET AL.: "Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography", JOURNAL OF BACUUM SCIENCE AND TECHNOLOGY B, vol. 26, no. 5, 5 September 2008 (2008-09-05), pages 1684 - 1689, XP012114351, DOI: doi:10.1116/1.2966433
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
Tadashige Ito (JP)
Tadashige Ito (JP)
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