Title:
PERMANENT DIELECTRIC COMPOSITIONS CONTAINING PHOTOACID GENERATOR AND BASE
Document Type and Number:
WIPO Patent Application WO/2017/095829
Kind Code:
A3
Abstract:
Embodiments encompassing a series of compositions containing photoacid generator (PAG) and a base are disclosed and claimed. The compositions are useful as permanent dielectric materials. More specifically, embodiments encompassing compositions containing a series of copolymers of a variety of norbornene-type cycloolefinic monomers and maleic anhydride in which maleic anhydride is fully or partially hydrolyzed (i.e., ring opened and fully or partially esterified), PAG and a base, which are useful in forming permanent dielectric materials having utility in a variety of electronic material applications, among various other uses, are disclosed.
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Inventors:
KANDANARACHCHI PRAMOD (US)
Application Number:
PCT/US2016/064047
Publication Date:
August 03, 2017
Filing Date:
November 30, 2016
Export Citation:
Assignee:
PROMERUS LLC (US)
International Classes:
C08L45/00; C08F8/12; C08F8/14; C08F222/04; C08F232/00; C08K5/00; C08L35/00; C08L35/02; G03F7/004; G03F7/038; G03F7/039; H01L21/027
Foreign References:
EP1254915A2 | 2002-11-06 | |||
EP0789278A2 | 1997-08-13 | |||
US20020018960A1 | 2002-02-14 | |||
US20120129101A1 | 2012-05-24 |
Other References:
HYUN-PYO JEON ET AL: "New ArF Photoresist Based on Modified Malefic Anhydride Cycloolefin Polymers", JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 10 August 2002 (2002-08-10), Hiratsuka, pages 541 - 548, XP055365710, Retrieved from the Internet
Attorney, Agent or Firm:
GUPTA, Balaram (US)
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