Title:
PERMANENT MAGNET AND MANUFACTURING METHOD FOR PERMANENT MAGNET
Document Type and Number:
WIPO Patent Application WO/2011/125589
Kind Code:
A1
Abstract:
Disclosed are a permanent magnet and a manufacturing method for the permanent magnet in which V, Mo, Zr, Ta, Ti, W, or Nb contained in an organometallic compound can be segregated to the grain boundaries of a magnet. An organometallic compound solution, to which an organometallic compound represented by the formula M-(OR)x has been added, is added to a fine powder of a pulverized neodymium magnet, and the organometallic compound is uniformly deposited on the surface of the neodymium magnet grains. Afterwards, calcination in hydrogen is carried out by retaining a molded article, formed by powder compacting, in a hydrogen atmosphere for several hours at 200℃-900℃. Afterwards, a permanent magnet is manufactured by sintering. (In the formula, M is V, Mo, Zr, Ta, Ti, W, or Nb. R is a substituent group comprising a hydrocarbon, and can be a straight chain or a branched chain. x is an arbitrary integer.)
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Inventors:
OZEKI IZUMI (JP)
KUME KATSUYA (JP)
HIRANO KEISUKE (JP)
OMURE TOMOHIRO (JP)
TAIHAKU KEISUKE (JP)
OZAKI TAKASHI (JP)
KUME KATSUYA (JP)
HIRANO KEISUKE (JP)
OMURE TOMOHIRO (JP)
TAIHAKU KEISUKE (JP)
OZAKI TAKASHI (JP)
Application Number:
PCT/JP2011/057570
Publication Date:
October 13, 2011
Filing Date:
March 28, 2011
Export Citation:
Assignee:
NITTO DENKO CORP (JP)
OZEKI IZUMI (JP)
KUME KATSUYA (JP)
HIRANO KEISUKE (JP)
OMURE TOMOHIRO (JP)
TAIHAKU KEISUKE (JP)
OZAKI TAKASHI (JP)
OZEKI IZUMI (JP)
KUME KATSUYA (JP)
HIRANO KEISUKE (JP)
OMURE TOMOHIRO (JP)
TAIHAKU KEISUKE (JP)
OZAKI TAKASHI (JP)
International Classes:
H01F41/02; B22F1/16; B22F3/00; C22C38/00; H01F1/053; H01F1/08; C22C33/02
Foreign References:
JP2009259956A | 2009-11-05 | |||
JP2004250781A | 2004-09-09 | |||
JP3298219B2 | 2002-07-02 |
Other References:
See also references of EP 2503570A4
Attorney, Agent or Firm:
NEXT INTERNATIONAL (JP)
Patent business corporation NeXT (JP)
Patent business corporation NeXT (JP)
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Claims: