Title:
PHASE SHIFT AMOUNT MEASUREMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/126215
Kind Code:
A1
Abstract:
The present invention is a device for measuring the phase shift amount of a phase shift mask 15, said device being provided with: a diffraction grating 7 for diffracting linearly polarized light and generating a plurality of diffracted light beams on a single optical path from a light source 1 to an imaging device 2 for imaging a double interference image; a Nomarski prism 11 for generating a sidways-shifted double image of a pattern of the phase shift mask 15 and causing diffracted light that has passed through a pattern part 18 of the phase shift mask 15 and a phase shifter part 19 of the phase shift mask 15 to interfere; and a movement means 21 for moving the Nomarski prism 11 by sliding the Nomarski prism 11 in the direction of the generation of the double image.
Inventors:
YONEZAWA MAKOTO (JP)
Application Number:
PCT/JP2016/084591
Publication Date:
July 27, 2017
Filing Date:
November 22, 2016
Export Citation:
Assignee:
V TECH CO LTD (JP)
International Classes:
G01N21/45; G01J9/02; G01M11/00; G01N21/27; G03F1/84
Foreign References:
| JP2015137928A | 2015-07-30 | |||
| JP2015108702A | 2015-06-11 | |||
| JP2011523711A | 2011-08-18 | |||
| JP2008185582A | 2008-08-14 | |||
| JP2000241121A | 2000-09-08 | |||
| JPH1078648A | 1998-03-24 | |||
| JPH07280657A | 1995-10-27 |
Attorney, Agent or Firm:
OGAWA, Moriaki et al. (JP)
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