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Title:
PHASE SHIFT MASK AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2014/103875
Kind Code:
A1
Abstract:
A method for producing a phase shift mask includes a step of forming a second mask (RP2) having a predetermined aperture pattern in such a manner that: a light-blocking layer (13) exposed on a surface and pattern apertures is covered; and an etching stopper layer (12) and a phase shift layer (11) that are exposed on the pattern apertures are not covered in light-blocking regions and are covered in phase-shift regions.

Inventors:
KAGEYAMA KAGEHIRO (JP)
MOCHIZUKI SATORU (JP)
NAKAMURA DAISUKE (JP)
Application Number:
PCT/JP2013/084089
Publication Date:
July 03, 2014
Filing Date:
December 19, 2013
Export Citation:
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Assignee:
ULVAC COATING CORP (JP)
International Classes:
G03F1/32; G03F1/29; H01L21/027
Foreign References:
JP2008203374A2008-09-04
JPH08334885A1996-12-17
JPH08334886A1996-12-17
JPH08292550A1996-11-05
JPH0450942A1992-02-19
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
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