Title:
PHENOL MONOMER, POLYMER FOR FORMING A RESIST UNDERLAYER FILM INCLUDING SAME, AND COMPOSITION FOR A RESIST UNDERLAYER FILM INCLUDING SAME
Document Type and Number:
WIPO Patent Application WO/2013/066067
Kind Code:
A1
Abstract:
Disclosed are a phenol monomer, a polymer for forming a resist underlayer film including same, and a composition for a resist underlayer film including same, which are to be used in a semiconductor lithography process. The phenol monomer is represented by chemical formula 1 in claim 1.
Inventors:
KIM JEONG-SIK (KR)
LEE JAE-WOO (KR)
KIM JAE-HYUN (KR)
LEE JAE-WOO (KR)
KIM JAE-HYUN (KR)
Application Number:
PCT/KR2012/009111
Publication Date:
May 10, 2013
Filing Date:
November 01, 2012
Export Citation:
Assignee:
DONGJIN SEMICHEM CO LTD (KR)
International Classes:
C07D311/86; C07D495/10; C08G61/12; G03F7/004
Domestic Patent References:
| WO2007007176A2 | 2007-01-18 |
Foreign References:
| KR20090046101A | 2009-05-11 | |||
| EP2219076A1 | 2010-08-18 |
Other References:
ZHANG, S-J. ET AL.: "High organosolubility and optical transparency of novel polyimides derived from 2,7-bis(4-amino-2-trifluoromethylphenoxy)-spiro(fluorene-9,9-xanthene).", MATERIALS CHEMISTRY AND PHYSICS., vol. 128, no. IS.3, 15 August 2011 (2011-08-15), pages 392 - 399, XP028091471
TSENG, Y-H. ET AL.: "Stable Organic Blue-Light-Emitting Devices Prepared from Poly[spiro (fluorene-9,9' -xanthene)].", MACROMOLECULES., vol. 38, no. 24, 2005, pages 10055 - 10060, XP055064578
TSENG, Y-H. ET AL.: "Stable Organic Blue-Light-Emitting Devices Prepared from Poly[spiro (fluorene-9,9' -xanthene)].", MACROMOLECULES., vol. 38, no. 24, 2005, pages 10055 - 10060, XP055064578
Attorney, Agent or Firm:
LEE, SANG-HUN (KR)
이상헌 (KR)
이상헌 (KR)
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