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Title:
PHOSPHORUS-CONTAINING EPOXY RESIN AND PHOSPHORUS-CONTAINING EPOXY RESIN COMPOSITION, PROCESS FOR PRODUCING THE SAME, AND CURABLE RESIN COMPOSITION AND CURED OBJECT EACH CONTAINING OR OBTAINED FROM THE RESIN AND THE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2009/060987
Kind Code:
A1
Abstract:
A phosphorus-containing phenol compound represented by the general formula (2) in which the content of a compound represented by the general formula (1) is 2.5 wt.% or lower is used to obtain a phosphorus-containing epoxy resin having high curability. This highly reactive phosphorus-containing epoxy resin and a phosphorus-containing epoxy resin composition containing the resin are suitable for use in applications such as a sealing material, molding material, potting material, adhesive, material for electrical insulating coatings, electrical insulating sheet, resin-coated copper foil, prepreg, electrical laminate, etc. for use in producing copper-clad laminates for electronic circuit boards and in producing electronic parts. Also provided are: a curable resin composition containing either of the resin and the resin composition; and a cured object obtained from either of the resin and the resin composition. General formula (1) (1) Symbol n is 0 or 1. R1 and R2 each represents hydrogen or a hydrocarbon group, may be the same or different, and may be linear, branched, or cyclic. R1 and R2 may be bonded to each other to form a cyclic structure. B represents any of benzene, biphenyl, naphthalene, anthrancene, phenanthrene, and substituted forms of these hydrocarbons. General formula (2) (2) Symbol n is 0 or 1. R1 and R2 each represents hydrogen or a hydrocarbon group, may be the same or different, and may be linear, branched, or cyclic. R1 and R2 may be bonded to each other to form a cyclic structure. B represents any of benzene, biphenyl, naphthalene, anthrancene, phenanthrene, and substituted forms of these hydrocarbons.

Inventors:
NAKANISHI, Tetsuya (Tohto Kasei Co. Ltd.,11-5, Kitasode, Sodegaura-shi, Chiba 66, 2990266, JP)
中西 哲也 (〒66 千葉県袖ヶ浦市北袖11番地5 東都化成株式会社エポキシ開発センター内 Chiba, 2990266, JP)
Application Number:
JP2008/070622
Publication Date:
May 14, 2009
Filing Date:
November 06, 2008
Export Citation:
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Assignee:
TOHTO KASEI CO., LTD. (14-1, Sotokanda 4-chomeChiyoda-ku, Tokyo 21, 1010021, JP)
東都化成株式会社 (〒21 東京都千代田区外神田四丁目14番1号 Tokyo, 1010021, JP)
NAKANISHI, Tetsuya (Tohto Kasei Co. Ltd.,11-5, Kitasode, Sodegaura-shi, Chiba 66, 2990266, JP)
International Classes:
C08G59/14; C08F299/02; C08G59/20; H01L23/14; H01L23/29; H01L23/31
Domestic Patent References:
WO2000044805A1
Foreign References:
JP2000309624A
JPS60126293A
JPS61236787A
JPH05331179A
Other References:
WANG C.S. ET AL.: 'Synthesis and Properties of Phosphorus Containing Advanced Epoxy Resins' JOURNAL OF APPLIED POLYMER SCIENCE vol. 75, no. 3, 22 November 1999, page 429
Attorney, Agent or Firm:
TANAKA, Hiroshi et al. (Hougaku Bldg. 7F, 19-14 Toranomon 1-chom, Minato-ku Tokyo 01, 1050001, JP)
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