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Patent Searching and Data


Title:
PHOTO-ACID GENERATING AGENT
Document Type and Number:
WIPO Patent Application WO/2016/043558
Kind Code:
A1
Abstract:
The present invention relates to a compound, wherein the compound comprises at least one structural element A and at least one structural element B, wherein - structural element A is capable of releasing an acid upon exposure to electromagnetic radiation; - structural element B comprises at least one basic functional group, wherein the basic functional group comprises a primary, secondary or tertiary amine group. The present invention also relates to a composition comprising this compound, to a process for producing a composite, to the composite obtained by the process according to the present invention, to a composite comprising a substrate and a coating applied on the surface of the substrate in a patterned structure and to the use of the compound according to the present invention for photoinduced polymerization, photoinduced crosslinking, photoinduced degradation and photoinduced transformation of functional groups.

Inventors:
LEE YEONG BEOM (KR)
CHO HYUN YONG (KR)
Application Number:
PCT/KR2015/009838
Publication Date:
March 24, 2016
Filing Date:
September 18, 2015
Export Citation:
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Assignee:
HERAEUS MATERIALS KOREA CORP (KR)
International Classes:
C07D221/14; C07D401/04; C07D411/04; C07D413/04; G03F7/004
Foreign References:
US20030064315A12003-04-03
US20050038261A12005-02-17
US20110008731A12011-01-13
US20120156618A12012-06-21
US20130137037A12013-05-30
CN103389621A2013-11-13
Attorney, Agent or Firm:
LEE & PARK (112 Banpo-Daero,Seocho-gu, Seoul, KR)
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