Title:
PHOTO-ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE USING SAID RESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2019/087626
Kind Code:
A1
Abstract:
Provided are: a compound which can be used suitably as a photodegradable base in a resist composition that has good sensitivity to an active energy, has excellent resolution in lithography and enables the reduction in line width roughness (LWR) in a fine pattern; and a resist composition prepared using the compound. A photo-acid generator containing an onium salt compound represented by formula (1). (In formula (1), R1 and R2 independently represent any one selected from the group consisting of a hydrogen atom, a linear, branched or cyclic alkyl group which has 1 to 30 carbon atoms and may have a substituent, a linear, branched or cyclic alkenyl group which has 5 to 30 carbon atoms and may have a substituent, an aryl group which has 5 to 30 carbon atoms and may have a substituent, and a heteroaryl group which has 3 to 30 carbon atoms and may have a substituent, wherein at least one of R1 and R2 is not a hydrogen atom, a methylene group in at least one of R1 and R2 may be substituted by a bivalent hetero-atom-containing group when each of R1 and R2 has a methylene group, and R1 and R2 may be directly bonded to each other via a single bond or may form a cyclic structure through at least one selected from the group consisting of an oxygen atom, a sulfur atom, a nitrogen-atom-containing group, a methylene group and a carbonyl group in conjunction with a nitrogen atom to which both of R1 and R2 are bonded; L represents a bivalent linking group represented by -(CF2)n-; n represents an integer of 1 or more; and S and M+ independently represent a monovalent onium cation.)
Inventors:
KAMAKURA TAKAHIRO (JP)
UTSUMI YOSHIYUKI (JP)
UTSUMI YOSHIYUKI (JP)
Application Number:
PCT/JP2018/035787
Publication Date:
May 09, 2019
Filing Date:
September 26, 2018
Export Citation:
Assignee:
TOYO GOSEI CO LTD (JP)
International Classes:
G03F7/004; C07C235/06; C07C235/14; C07C235/16; C07C381/12; C07D295/185; C07D295/205; C09K3/00; G03F7/039; G03F7/20
Foreign References:
| JP2013200561A | 2013-10-03 | |||
| JP2005250158A | 2005-09-15 |
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
Download PDF: