Title:
PHOTO-ALIGNMENT EXPOSURE APPARATUS AND PHOTO-ALIGNMENT EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2020/105281
Kind Code:
A1
Abstract:
The present invention achieves space saving and cost reduction for an oblique-exposure photo-alignment exposure apparatus capable of creating a stable pre-tilt angle, while allowing the photo-alignment exposure apparatus to achieve effective oblique exposure on a workpiece having a wide area to be processed by the scanning exposure method. The photo-alignment exposure apparatus includes an irradiation unit for irradiating the surface of a workpiece to be made into a photo-alignment film with polarized light and a scanner unit that moves the surface of the workpiece relative to the light irradiation region irradiated by the irradiation unit; the irradiation unit includes an oblong light source that is longer along the width direction of the workpiece and an irradiation angle restricting part that limits the irradiation angle of light emitted onto the light irradiation region to a specific direction along the width direction.
Inventors:
YOSHIDA YUJI (JP)
IKEDA SATOSHI (JP)
ARAI TOSHINARI (JP)
IKEDA SATOSHI (JP)
ARAI TOSHINARI (JP)
Application Number:
PCT/JP2019/038227
Publication Date:
May 28, 2020
Filing Date:
September 27, 2019
Export Citation:
Assignee:
V TECH CO LTD (JP)
International Classes:
G02F1/1337
Foreign References:
| JP2004144884A | 2004-05-20 | |||
| JP2014026133A | 2014-02-06 | |||
| CN103558714A | 2014-02-05 |
Attorney, Agent or Firm:
EICHI PATENT & TRADEMARK CORP. (JP)
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