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Title:
PHOTO-ALIGNMENT IRRADIATION DEVICE AND METHOD FOR ADJUSTING APERTURE OF PHOTO-ALIGNMENT IRRADIATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/040664
Kind Code:
A1
Abstract:
[Problem] To measure the integrated amount of light emitted through an aperture in a photo-alignment irradiation device equipped with a partially-shielding member for adjusting the blocked amount of light emitted through the aperture to determine the amount of light blocked by the partially-shielding member. [Solution] A photo-alignment irradiation device according to the present invention is characterized by performing alignment processing during which a substrate is irradiated with polarized light emitted through the aperture while a scanning unit moves a polarized light irradiation unit and a stage relative to each other, and measurement processing during which a photosensor receives the polarized light emitted through the aperture at each position of the partially-shielding member while the scanning unit moves the stage and the polarized light irradiation unit relative to each other, and the integrated amount of light is measured by temporally integrating illuminance measured by the photosensor.

Inventors:
OHTANI YOSHIKAZU (JP)
NAKAMURA MIZUKI (JP)
Application Number:
PCT/JP2013/074997
Publication Date:
March 26, 2015
Filing Date:
September 17, 2013
Export Citation:
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Assignee:
SHINETSU ENG CO LTD (JP)
FK OPT LABO CO LTD (JP)
International Classes:
G02F1/1337
Foreign References:
JP2013045053A2013-03-04
JP2002350858A2002-12-04
JP2005234266A2005-09-02
JP2012221726A2012-11-12
JP5105567B12012-12-26
Attorney, Agent or Firm:
MINAMI, Yoshiaki et al. (JP)
South Yoshiaki (JP)
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