Title:
PHOTO-ELECTRIC-FIELD ENHANCEMENT DEVICE AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2014/156088
Kind Code:
A1
Abstract:
[Problem] To provide a high-sensitivity photo-electric-field enhancement device wherein optical anisotropy is reduced. [Solution] In this photo-electric-field enhancement device, in which exposure to excitation light induces localized plasmons on a surface and said exposure enhances the intensity of signal light emitted by a sample placed on said surface, randomly arrayed needle-shaped asperities (12) are formed on a substrate (10) and a metal is deposited from a direction that is at an angle with respect to the direction perpendicular to the substrate plane on which said needle-shaped asperities (12) are formed, thereby forming slab-shaped microscopic metal structures (14) at the tips of the needle-shaped asperities (12).
Inventors:
YAMAZOE SHOGO (JP)
Application Number:
PCT/JP2014/001617
Publication Date:
October 02, 2014
Filing Date:
March 20, 2014
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G01N21/65; B82Y20/00; B82Y30/00; B82Y40/00; G01N21/01
Domestic Patent References:
| WO2011133144A1 | 2011-10-27 | |||
| WO2012127841A1 | 2012-09-27 | |||
| WO2012024006A2 | 2012-02-23 | |||
| WO2012015443A1 | 2012-02-02 |
Foreign References:
| JP2012211839A | 2012-11-01 | |||
| US20110166045A1 | 2011-07-07 |
Attorney, Agent or Firm:
YANAGIDA, Masashi et al. (JP)
Seiji Yanagida (JP)
Seiji Yanagida (JP)
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