Title:
PHOTO MASK WITH EXPOSURE COMPENSATION FUNCTION
Document Type and Number:
WIPO Patent Application WO/2018/010227
Kind Code:
A1
Abstract:
A photo mask with an exposure compensation function (1, 2, 3, 4, 5), comprising light shielded areas (11, 21, 31, 41, 51) and exposure areas (12, 22, 32, 42, 52) surrounded by the light shielded areas (11, 21, 31, 41, 51). The exposure areas (12, 22, 32, 42, 52) comprise compensation sub-areas (121, 221, 321, 421, 521) and exposure sub-areas (122, 222, 322, 422, 522); the compensation sub-areas (121, 221, 321, 421, 521) are provided around the vertex of an acute angle of the exposure sub-areas (122, 222, 322, 422, 522).
Inventors:
ZHANG CHUNQIAN (CN)
CHEN CAIQIN (CN)
CHEN CAIQIN (CN)
Application Number:
PCT/CN2016/093068
Publication Date:
January 18, 2018
Filing Date:
August 03, 2016
Export Citation:
Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
G03F1/38
Foreign References:
| CN106019815A | 2016-10-12 | |||
| US20030162103A1 | 2003-08-28 | |||
| CN101297390A | 2008-10-29 | |||
| US6044007A | 2000-03-28 | |||
| US5707765A | 1998-01-13 | |||
| US20060105249A1 | 2006-05-18 | |||
| CN1858884A | 2006-11-08 | |||
| JP2004093705A | 2004-03-25 |
Attorney, Agent or Firm:
ESSEN PATENT & TRADEMARK AGENCY (CN)
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