Title:
PHOTO MASK WITH EXPOSURE COMPENSATION FUNCTION
Document Type and Number:
WIPO Patent Application WO/2018/010228
Kind Code:
A1
Abstract:
A photo mask with an exposure compensation function (1, 2), comprising light shielded areas (11, 21) and exposure areas (12, 22) surrounded by the light shielded areas (11, 21). The exposure areas (12, 22) comprise compensation sub-areas (121, 221) and exposure sub-areas (122, 222); the compensation sub-areas (121, 221) are provided along both sides from the vertex of an acute angle of the exposure sub-areas (122, 222).
Inventors:
ZHANG CHUNQIAN (CN)
CHEN CAIQIN (CN)
WANG CHAO (CN)
ZHANG QIPEI (CN)
CHEN CAIQIN (CN)
WANG CHAO (CN)
ZHANG QIPEI (CN)
Application Number:
PCT/CN2016/093069
Publication Date:
January 18, 2018
Filing Date:
August 03, 2016
Export Citation:
Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
G03F1/38
Foreign References:
| CN106200257A | 2016-12-07 | |||
| US20030162103A1 | 2003-08-28 | |||
| CN101297390A | 2008-10-29 | |||
| US6044007A | 2000-03-28 | |||
| US5707765A | 1998-01-13 | |||
| US20060105249A1 | 2006-05-18 | |||
| CN1858884A | 2006-11-08 | |||
| JP2004093705A | 2004-03-25 |
Attorney, Agent or Firm:
ESSEN PATENT & TRADEMARK AGENCY (CN)
Download PDF:
Previous Patent: PHOTO MASK WITH EXPOSURE COMPENSATION FUNCTION
Next Patent: METHOD AND DEVICE FOR MANUFACTURING ORGANIC THIN-FILM TRANSISTOR
Next Patent: METHOD AND DEVICE FOR MANUFACTURING ORGANIC THIN-FILM TRANSISTOR