Title:
PHOTOACID GENERATOR MATERIAL, PHOTOLITHOGRAPHY MATERIAL, AND PATTERN FILM MANUFACTURING METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2010/029948
Kind Code:
A1
Abstract:
Provided are a photoacid generator with suitably low light absorption and high photoacid generating efficiency, a photoacid generator material and a photolithography material using the same, and a pattern film manufacturing method using the same. Disclosed is a photoacid generator material that includes an oxime-based photoacid generator having an alicyclic structure. In this case, it is preferable that the oxime-based photoacid generator have an adamantane skeleton, and more specifically, the generator is a compound represented by the formula. (1)
Inventors:
TAKAHARA SHIGERU (JP)
Application Number:
PCT/JP2009/065761
Publication Date:
March 18, 2010
Filing Date:
September 09, 2009
Export Citation:
Assignee:
UNIV CHIBA NAT UNIV CORP (JP)
TAKAHARA SHIGERU (JP)
TAKAHARA SHIGERU (JP)
International Classes:
C09K3/00; G03F7/004; C07C309/73
Foreign References:
| JPH09301948A | 1997-11-25 | |||
| JP2004004551A | 2004-01-08 | |||
| JP2007269853A | 2007-10-18 |
Attorney, Agent or Firm:
TAKAHASHI, MASAYOSHI (JP)
Masayoshi Takahashi (JP)
Masayoshi Takahashi (JP)
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