Title:
PHOTOACID GENERATOR AND PHOTOLITHOGRAPHIC RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2019/216174
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a non-ionic photoacid generator having a naphthalimide structure and having all of the properties of compatibility, high sensitivity, thermal stability, and base resistance required of high-resolution i-line photolithography resist materials. The present invention pertains to: a non-ionic photoacid generator (A) represented by general formula (1); and a photolithographic resin composition (Q) containing the non-ionic photoacid generator (A). [In formula (1), R1 is a C1-12 hydrocarbon group, a hydroxy group, an alkoxy group, an alkylthio group, an alkylcarbonyl group, an alkoxycarbonyl group, an alkylcarbonyloxy group, or an alkyl carbonate group, one of R2-R6 is a C1-12 hydrocarbon group, a hydroxy group, an alkoxy group, an alkylthio group, an alkylcarbonyl group, an alkoxycarbonyl group, an alkylcarbonyloxy group, or an alkyl carbonate group, the rest being hydrogen atoms, and Rf is a fluorine atom, or a C1-18 hydrocarbon group in which at least one hydrogen is substituted with fluorine.]
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Inventors:
KIZU TOMOHITO (JP)
SHIBAGAKI TOMOYUKI (JP)
NAKAMURA YUJI (JP)
SHIBAGAKI TOMOYUKI (JP)
NAKAMURA YUJI (JP)
Application Number:
PCT/JP2019/016993
Publication Date:
November 14, 2019
Filing Date:
April 22, 2019
Export Citation:
Assignee:
SAN APRO LTD (JP)
International Classes:
G03F7/004; C09K3/00; G03F7/038
Domestic Patent References:
| WO2015001804A1 | 2015-01-08 |
Foreign References:
| JP2016089085A | 2016-05-23 | |||
| JP2017535595A | 2017-11-30 | |||
| EP3182203A1 | 2017-06-21 | |||
| JP2017197641A | 2017-11-02 | |||
| JP2019056896A | 2019-04-11 |
Attorney, Agent or Firm:
HAYASHI Hiroshi (JP)
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