Title:
PHOTOACID GENERATOR AND PHOTOREACTIVE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2011/129206
Kind Code:
A1
Abstract:
Provided are: a photoacid generator which exhibits remarkably high sensitivity in a near ultraviolet region of about 300 to 400nm and which can ensure a very high reaction rate; and a photoreactive composition which, when irradiated with a near ultraviolet ray, can react in a very short time. More specifically provided are: a phenylthiophenesulfonium salt represented by chemical formula (1); and a photoreactive composition that contains the salt. In chemical formula (1), R1 to R3 are each independently a hydrogen atom, a halogen atom, C1-4 halogenated alkyl, C1-10 alkyl, C1-4 alkoxy, C1-8 acyl, or hydroxyl; and X- is an anion.
Inventors:
YAMAMOTO KATSUMASA (JP)
YAMAGUCHI HIROFUMI (JP)
MYOKEN HIDEHIKO (JP)
YAMAGUCHI HIROFUMI (JP)
MYOKEN HIDEHIKO (JP)
Application Number:
PCT/JP2011/058442
Publication Date:
October 20, 2011
Filing Date:
April 01, 2011
Export Citation:
Assignee:
SUMITOMO SEIKA CHEMICALS (JP)
YAMAMOTO KATSUMASA (JP)
YAMAGUCHI HIROFUMI (JP)
MYOKEN HIDEHIKO (JP)
YAMAMOTO KATSUMASA (JP)
YAMAGUCHI HIROFUMI (JP)
MYOKEN HIDEHIKO (JP)
International Classes:
C07D333/34; C08F2/50; C08G59/68; C08G65/10; C08G65/18
Domestic Patent References:
| WO2009069428A1 | 2009-06-04 |
Foreign References:
| JP2004189720A | 2004-07-08 | |||
| JP2008273878A | 2008-11-13 | |||
| JPS54151936A | 1979-11-29 | |||
| US3205157A | 1965-09-07 | |||
| JP2008273879A | 2008-11-13 | |||
| JP2008239519A | 2008-10-09 |
Attorney, Agent or Firm:
TANAKA, Mitsuo et al. (JP)
Mitsuo Tanaka (JP)
Mitsuo Tanaka (JP)
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