Title:
PHOTOACID GENERATOR
Document Type and Number:
WIPO Patent Application WO/2022/030139
Kind Code:
A1
Abstract:
The present invention provides a useful photoacid generator which is used for a photocurable composition or a chemically amplified negative photoresist composition, and which is useful for yellowing resistance of these compositions. The present invention provides a photoacid generator which is characterized by containing a sulfonium salt (CA) represented by general formula (1) and a compound (S) represented by general formula (2), and which is also characterized in that if the total content of the sulfonium salt (CA) and the compound (S) is determined by high-speed liquid chromatography (HPLC) and the total area of the sulfonium salt (CA) and the compound (S) is taken as 100, the area ratio of the compound (S) is from 0.02 to 3.0.
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Inventors:
KIMURA HIDEKI (JP)
SHIRAISHI ATSUSHI (JP)
SHIRAISHI ATSUSHI (JP)
Application Number:
PCT/JP2021/024283
Publication Date:
February 10, 2022
Filing Date:
June 28, 2021
Export Citation:
Assignee:
SAN APRO LTD (JP)
International Classes:
C08G59/68; C09K3/00; G03F7/004; G03F7/038
Domestic Patent References:
| WO2011016425A1 | 2011-02-10 | |||
| WO2005000801A1 | 2005-01-06 |
Foreign References:
| JP2010254654A | 2010-11-11 | |||
| JPS61212554A | 1986-09-20 |
Attorney, Agent or Firm:
HAYASHI Hiroshi (JP)
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