PHOTOCATALYST ARTICLE, ARTICLE PREVENTED FROM FOGGING AND FOULING, AND PROCESS FOR PRODUCING ARTICLE PREVENTED FROM FOGGING AND FOULING

Title:

PHOTOCATALYST ARTICLE, ARTICLE PREVENTED FROM FOGGING AND FOULING, AND PROCESS FOR PRODUCING ARTICLE PREVENTED FROM FOGGING AND FOULING

Document Type and Number:

WIPO Patent Application WO/2000/018504

Kind Code:

A1

Abstract:

A photocatalyst article containing an oxide semiconductor which contains a compound of at least one element selected from the group consisting of Mg, Sc, V, Cr, Mn, Y, Nb, Mo, Ru, W, and Re in such an amount that the ratio of (A) the number of atoms of the metallic element to (B) that of atoms of the metal(s) as a component of the semiconductor, (A/B), is from 0.20 to 2. The article has high photocatalytic activity even when irradiated with slight ultraviolet or visible light, is highly prevented from fogging and fouling, and satisfactorily retains this property over long. It is valuable as an article prevented from fogging and fouling.

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Inventors:

DOUSHITA KAZUHIRO (JP)
INOMATA HIROYUKI (JP)

Application Number:

PCT/JP1999/005304

Publication Date:

April 06, 2000

Filing Date:

September 28, 1999

Export Citation:

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Assignee:

NIPPON SHEET GLASS CO LTD (JP)
DOSHITA KAZUHIRO (JP)
INOMATA HIROYUKI (JP)

International Classes:

B01J35/00; C03C17/00; C03C17/23; C03C17/34; (IPC1-7): B01J35/02; C03C17/34

Foreign References:

JPH01232966A	1989-09-18
JPH01238867A	1989-09-25
JPH01288321A	1989-11-20
JPH01288322A	1989-11-20
JPH07124464A	1995-05-16
JPH09299808A	1997-11-25
JPH09241037A	1997-09-16
EP0816466A1	1998-01-07
JPH10231146A	1998-09-02
EP0820967A1	1998-01-28
JPH10152346A	1998-06-09

Other References: