Title:
PHOTOCATALYST STRUCTURE AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2017/146015
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a photocatalyst support material for easily forming a photocatalyst layer that achieves adequate photocatalytic activity by high-temperature firing, and has an excellent external appearance. The present invention is a coating liquid for forming a photocatalytic layer for high-temperature baking, wherein the coating liquid contains, in relation to a solvent and the total coating liquid, 0.1-6 mass% of photocatalytic particles, 0.5-9 mass% of silica particles, 0.1-5 mass% in terms of oxide of a zirconium compound, and 0.5-9 mass% in terms of oxide of an aluminum compound. After the coating liquid for forming a photocatalytic layer is applied to at least a part of a substrate surface, baking is performed at 300°C or higher, whereby a photocatalyst-supporting structure can be manufactured.
Inventors:
KOBAYASHI DAIYA (JP)
AKITA KATSUYUKI (JP)
AKITA KATSUYUKI (JP)
Application Number:
PCT/JP2017/006279
Publication Date:
August 31, 2017
Filing Date:
February 21, 2017
Export Citation:
Assignee:
NIPPON SODA CO (JP)
International Classes:
B01J21/06; B01J35/02; B01J37/02; B01J37/08; C09D1/00; C09D5/00; C09D7/12
Domestic Patent References:
| WO1998015600A1 | 1998-04-16 | |||
| WO1999033565A1 | 1999-07-08 |
Foreign References:
| JP2001070801A | 2001-03-21 | |||
| JP2007055207A | 2007-03-08 | |||
| JP2009039687A | 2009-02-26 |
Attorney, Agent or Firm:
HIROTA, Masanori (JP)
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